http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252
Outgoing Links
| Predicate | Object |
|---|---|
| concordantIPC | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| level | 13^^<http://www.w3.org/2001/XMLSchema#integer> |
| symbol | H01L21/02252 |
| modified | 2013-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| title | Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by plasma treatment, e.g. plasma oxidation of the substrate |
| type | http://data.epo.org/linked-data/def/cpc/SubGroup |
| broader | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02227 |
Incoming Links
Total number of triples: 2689.