| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76251
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-707 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 |
| filingDate |
2007-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62c4044c31803df0e30d5c213567dd0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdbfddb54ea1042ca05515ca5ac8753c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acbeed91b061525f2388183d22a7be9e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80e7bf29189a56167beaf9ff8bfac472
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ae6fc713d1de90d3fa5aa4925ebdf1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_772f185d73424aea4bbaac3f31c830a7 |
| publicationDate |
2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I611565-B |
| titleOfInvention |
Semiconductor device manufacturing method |
| abstract |
An object of the present invention is to suppress discharge of static electricity generated by peeling when an element forming layer including a semiconductor element is peeled off from a substrate. A release layer and an element formation layer are formed on the substrate. The support substrate that can be peeled off is then fixed to the upper surface of the element formation layer. The interface between the element forming layer and the peeling layer is peeled off by changing the shape of the element forming layer by the supporting substrate. At the time of peeling, a liquid is supplied to form a layer and a peeling layer which are gradually exposed by peeling off by a liquid such as pure water. The electric charges generated on the surfaces of the element forming layer and the peeling layer are diffused by the liquid, so that discharge due to peeling electrification can be eliminated. |
| priorityDate |
2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |