http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009054818-A

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filingDate 2007-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9f24bc708b1b28dc8709aaab3d2f171
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publicationDate 2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009054818-A
titleOfInvention Plasma processing apparatus, plasma processing method, and end point detection method
abstract PROBLEM TO BE SOLVED: To accurately detect an end point in plasma processing. A plasma processing apparatus 100 measures the integrated value of the number of particles of active species in plasma that moves toward a target object (wafer W) and plasma generation means that generates plasma in a chamber 1. And a control unit 50 that controls the plasma processing to be terminated when the integrated value of the measured number of particles reaches a set value. The measurement unit 60 measures the number of active species by irradiating a predetermined laser beam from the light source unit 61 toward the plasma, and receiving the light by the detection unit 63 including a VUV monochromator. [Selection] Figure 1
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Total number of triples: 26.