| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6813f68bbadbcaae3828aa035190fede
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89b170728e9b1de7f20c98f2fbc2a113 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-332 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32366
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32651
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2020-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a1e4e729af35917ef626517db58ba79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05dbe4d39d0daa7f9a2dadc15dbcf77c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_865f29b57d5e9af7dfcd0f44ba953be0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc04c2b338975961a41d36f84b406c8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51cffe52979b96db83815c55fdb89197 |
| publicationDate |
2021-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-112447483-A |
| titleOfInvention |
The method used to process the workpiece |
| abstract |
The present disclosure provides processes for providing nitridation on workpieces such as semiconductors. In one example embodiment, a method may include supporting a workpiece on a workpiece support. The method may include exposing the workpiece to species generated from the capacitively coupled plasma to provide nitridation on the workpiece. The method may also include exposing the workpiece to a species generated from the inductively coupled plasma to provide nitridation on the workpiece. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113488383-A |
| priorityDate |
2019-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |