http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105679832-B

Outgoing Links

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filingDate 2015-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105679832-B
titleOfInvention Thin film transistor substrate and method of manufacturing the same
abstract The present disclosure provides a thin film transistor substrate and a method of manufacturing the same. A thin film transistor substrate includes: a gate electrode disposed on the base substrate; an active pattern overlapping the gate electrode; a source metal pattern including both a source electrode and a drain electrode spaced apart from the source electrode disposed on the active pattern; a buffer layer disposed on the source metal pattern and contacting the active pattern; a first passivation layer disposed on the buffer layer; and a second passivation layer disposed on the first passivation layer. The density of hydrogen in the buffer layer is greater than the density of hydrogen in the first passivation layer and less than the density of hydrogen in the second passivation layer.
priorityDate 2014-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 31.