http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080102273-A

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publicationDate 2008-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20080102273-A
titleOfInvention Plasma oxidation treatment method
abstract Within the treatment chamber of a plasma processing apparatus, using the processing gas containing oxygen and, O (1 D 2) the density of the radical 1 × 10 12 [㎝ -3] plasma treatment to oxidize the surface of the object to be processed by using a plasma or more To form a silicon oxide film. Between the plasma oxidation treatment, by the VUV monochrometer (63) by measuring the density of O (1 D 2) radicals in the plasma to compensate for the plasma processing condition.
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Total number of triples: 32.