| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_16820ecdc87db383d6d6334c58b35fde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31695 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2002-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58f74e16c43d11d12ad5d5ccc8200f18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2cc7eac5944ecdecee843f60db0c1c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8793b86f1222d8b4620d5dfc3833da4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b5e7b2e17f4f5afaa6d8643157a1097
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c790cbe3f281c08a651431aafbe0371e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49a355560284f11d5b345869f3e2756b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b30d006f1c9eb11180c8d04c0f3029b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03dc4e9aca293a47ebf179759adbe026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efce7ebc2500588fa7a0c50e32705164 |
| publicationDate |
2004-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6806182-B2 |
| titleOfInvention |
Method for eliminating via resistance shift in organic ILD |
| abstract |
Application of an adhesion promoter to a cap layer and oxidation of the adhesion promoter prior to deposition of an organic interlevel dielectric thereon reduces via resistance problems during thermal cycles of semiconductor wafers embodying multiple levels of metal and organic interlevel dielectrics. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7691736-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007190804-A1 |
| priorityDate |
2002-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |