| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2006-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8e6ba2bfd299c291aeb54ac1ccf0a4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a2e5f740ccb60abdffe52be720174b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a98876af6c745370e4ee10c8ef6baca |
| publicationDate |
2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007088454-A |
| titleOfInvention |
Method and system for forming a layer with controllable spatial variation |
| abstract |
A method and system for processing a substrate surface. The surface is exposed to at least two types of radicals from at least two radical sources. Each corresponding radical from the radical source interacts with a different region of the substrate surface. The present invention suitably improves the uniformity of oxidation, nitridation, or both. [Selection] Figure 2 |
| priorityDate |
2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |