http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
Outgoing Links
| Predicate | Object |
|---|---|
| concordantIPC | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| level | 14^^<http://www.w3.org/2001/XMLSchema#integer> |
| symbol | C23C16/45551 |
| modified | 2013-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| title | Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments |
| type | http://data.epo.org/linked-data/def/cpc/SubGroup |
| broader | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45548 |
Incoming Links
Total number of triples: 2788.