http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201111547-A

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filingDate 2009-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2011-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201111547-A
titleOfInvention Film deposition apparatus, film deposition method, and computer-readable storage medium
abstract In a film deposition apparatus, a turntable is disposed in a vacuum container and includes a substrate placement area in which a substrate is placed. A substrate heating unit is disposed to heat the substrate placed on the turntable. First and second reactive gas supplying units are disposed a t mutually distant locations in a rotational direction of the turntable to respectively supply first and second reactive gases to first and second processing areas adjacent to the substrate placement area. A separation gas supplying unit is disposed to supply a separation gas to a separation area located between the first and second processing areas in the rotational direction. An exhaust port is arranged to exhaust the first and second reactive gases and the separation gas from the turntable. A temperature control part is arranged to heat or cool the vacuum container.
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