http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2834391-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c48c80c92b0668f555516d637b0dcc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4583 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45529 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45595 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67784 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 |
| filingDate | 2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cfbe6ca53c72fa3a9b16a352a27e27d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d623243727f8c3368b8d2811104b8c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9dd90eba3644bee42926557de87a9e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fada516669905b1ce63a20958d8dafcb |
| publicationDate | 2015-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2834391-A1 |
| titleOfInvention | Method for producing a substrate with stacked deposition layers |
| abstract | A stacked substrate is produced using an apparatus including an injector head device, and comprises the steps of providing an injector head device comprising a gas bearing pressure arrangement and injecting bearing gas from the gas bearing pressure arrangement against opposite substrate surfaces, to balance the substrate supportless in a conveying plane in the injector head device. Iteratively the steps are performed of contacting opposite substrate surfaces with a first precursor gas from a first precursor supply; and with a second precursor gas from a second precursor supply respectively, first and second precursor gases supplied in first and second deposition spaces arranged opposite and facing respective sides of the substrate; establishing relative motion between the deposition space and the substrate in the conveying plane, in order to convey the substrate to reactant spaces arranged in the injector head device opposite and facing respective sides of the substrate; and providing at least one of a reactant gas, plasma, laser-generated radiation, and/or ultraviolet radiation, in any or both reactant spaces for reacting any of the first and second precursor gas after deposition on at least part of the substrate surface in order to obtain an atomic layer on each of opposite sides of the substrate surface. First and second precursor gases are at least in one of the iterations supplied simultaneously on opposite substrate surfaces. |
| priorityDate | 2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.