| abstract |
A film forming method forms a film including a predetermined element on substrates placed on a turntable, by supplying a first reaction gas including the predetermined element from a first supply part and supplying a second reaction gas from a second supply part in a raised state of the turntable, and rotating the turntable a predetermined number of times in a state in which the separation gas is supplied from a separation gas supply part, and performs an anneal process at least before or after the film forming process, by supplying the separation gas or the second reaction gas from the first supply part and supplying the separation gas or the second reaction gas from the second supply part in a lowered state of the turntable, and rotating the turntable at least once in a state in which the separation gas is supplied from the separation gas supply part. |