http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016061468-A2

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filingDate 2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f11ef731a32c76ff3b4abd21b91da2a6
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publicationDate 2016-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2016061468-A2
titleOfInvention High-speed deposition of mixed oxide barrier films
abstract The present disclosure relates to metal oxide barrier films and particularly to high-speed methods for depositing such barrier films. Methods are disclosed that are capable of producing barrier films with water vapor transmission rates (WVTR) below 0.1 g/(m 2 •day). Methods are disclosed for continuously transporting a substrate within an atomic layer deposition (ALD) reactor and performing a limited number of ALD cycles to achieve a desired WVTR.
priorityDate 2014-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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