| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-13 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3141
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31616
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02178 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-04 |
| filingDate |
2008-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd47f88e46d4a2c8d1914d0c4d4e4f0d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58083082204eee124b808cd0fe5d915d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f7cdfaa3886857606a7e86412575ec7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95a804c1b7f76dca5ac1a007032d72bd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f01c1748d747f33b5f711d8d1fd47c15 |
| publicationDate |
2013-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101809195-B |
| titleOfInvention |
Process for selective area deposition of inorganic materials |
| abstract |
An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organic compound or polymer; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. An inorganic thin film material is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material. |
| priorityDate |
2007-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |