http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101676432-A

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filingDate 2009-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f7526ff0010d52496da9c3fa5210547
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publicationDate 2010-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-101676432-A
titleOfInvention Film deposition apparatus and film deposition method
abstract A deposition apparatus includes plural first plate members arranged within a hermetically-sealable cylindrical chamber, wherein the plural first plate members each having an opening are arranged in afirst direction along a center axis of the chamber with a first clearance therebetween; and plural second plate members arranged in the first direction with the first clearance therebetween, the plural second plate members being reciprocally movable through the openings of the plural first plate members. A first pair of first plate members among the plural first plate members provides a first passage for a first gas flowing in a second direction toward an inner circumferential surface of the chamber. A second pair of first plate members among the plural first plate members provides a second passage for a second gas flowing in the second direction. A pair of second plate members among the plural second plate members supports a wafer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102799083-A
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