http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201350614-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45563 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2013-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcf272077cd06d50bddfd0bebf9b5e64 |
| publicationDate | 2013-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201350614-A |
| titleOfInvention | Device with extended nozzle for chemical vapor deposition and atomic layer deposition and method of use |
| abstract | Provided is an atomic layer deposition apparatus and method comprising a processing chamber having a substrate holder with which at least one elongated nozzle is movable relative to the substrate holder. The processing chamber has a first gas at a first pressure and a second gas is provided from the elongated nozzle at a second pressure greater than the first pressure. |
| priorityDate | 2012-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.