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filingDate 2010-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101314015-B1
titleOfInvention Film forming apparatus, film forming method, and storage medium
abstract By rotating the rotary table on which the wafer is loaded around the vertical axis, the first reaction gas is supplied to the surface of the wafer to adsorb the reaction gas, and then the secondary reaction gas reacts with the first reaction gas to produce an intermediate product having fluidity. The gas and a second gas which reacts with this intermediate product to produce a reaction product are supplied to the surface of the wafer in this order, and the wafer is then heated by a heating lamp to densify the reaction product.
priorityDate 2009-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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