http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201025481-A

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filingDate 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201025481-A
titleOfInvention Film deposition apparatus and substrate process apparatus
abstract A disclosed film deposition apparatus has a separation gas supplying nozzle between reaction gas nozzles arranged away from each other in a rotation direction of a turntable on which a substrate is placed, and a ceiling member providing a lower ceiling surface on both sides of the separation gas supplying nozzle. In this film deposition apparatus, the separation gas supplying nozzle and the reaction gas nozzles are removably arranged along a circumferential direction of a chamber, and the ceiling member is removably attached on a ceiling plate of the chamber.
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