http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201602395-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32779 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 |
| filingDate | 2015-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1aedd07210894cbd1dbef79ae75a802d |
| publicationDate | 2016-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201602395-A |
| titleOfInvention | Substrate processing apparatus and substrate processing method |
| abstract | An object of the present invention is to impart a modification effect using a plasma to a substrate at a low cost.nThe substrate processing apparatus 10 according to the present invention includes a mounting table 14 having a substrate mounting region 14a on which the substrate W is placed, and a substrate mounting region 14a that is rotatable about an axis X, and a processing container 12 The processing chamber C including the first region R1 and the second region R2 is defined; the precursor gas supply unit 16 supplies the precursor gas to the first region R1; and the process gas supply unit 22b supplies the first region to the second region R2. a second gas; a plasma generating unit 22 that generates a plasma of the first or second gas in the second region R2; and a control unit that repeatedly supplies the first gas to the second region R2 for the first time 1 operation and repeated control of supplying the second gas to the second region R2 for the second operation of the second time. |
| priorityDate | 2014-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.