| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
| filingDate |
2016-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ffe5afdf36069aaab4950a455c17d67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fb20d65d65d9a78fd46c484b9c700b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21fcfbcd1ed8fa4fd394538f5a3cd79e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11ec8cd4a3003109e6400b2300439014 |
| publicationDate |
2019-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I650443-B |
| titleOfInvention |
Film forming device |
| abstract |
A film forming device is provided with a substrate placed on a rotating table provided in a processing container, the rotating table is rotated, and the substrate is heated by a heating mechanism to perform a predetermined film forming process. The film forming device includes: a contact type first temperature measuring mechanism, It measures the temperature of the heating mechanism; the non-contact second temperature measuring mechanism measures the temperature of the substrate placed on the turntable; and the control mechanism is based on the first measured value measured by the first temperature measuring mechanism and At least any one of the second measurement values measured by the second temperature measurement mechanism controls the power supply to the heating mechanism; the control mechanism is used when the substrate is subjected to a predetermined film formation process, and when the substrate is subjected to the process; When a container carries out or loads the substrate, the method of controlling the power supply to the heating mechanism is changed. |
| priorityDate |
2015-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |