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publicationDate 2010-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-101665921-A
titleOfInvention Film deposition apparatus, substrate processing apparatus and film deposition method
abstract A film deposition apparatus to form a thin film by supplying first and second reaction gases within a vacuum chamber includes a turntable, a protection top plate, first and second reaction gas supplyparts extending from a circumferential edge towards a rotation center of the turntable, and a separation gas supply part provided therebetween. First and second spaces respectively include the first and second reaction gas supply parts and have heights H1 and H2. A third space includes the separation gas supply part and has a height H3 lower than H1 and H2. The film deposition apparatus further includes a vacuum chamber protection part which surrounds the turntable and the first, second and third spaces together with the protection top plate to protect the vacuum chamber from corrosion.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105742211-A
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