| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32779
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
2014-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21fcfbcd1ed8fa4fd394538f5a3cd79e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b25e4700430685bfce89719b63e1b94c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b13b15ae666bc4df8241b6a26b7c4a8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fc3d709e782b03b13cde96822da5827
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e4a2d06118bcebab55fa0b03a477e64 |
| publicationDate |
2015-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015220293-A |
| titleOfInvention |
Plasma processing method and plasma processing apparatus |
| abstract |
A processing method and a processing apparatus capable of appropriately adjusting an in-plane processing amount of a surface to be processed such as a film for plasma processing. A plasma processing method for supplying a processing gas into a predetermined plasma processing region P2 and converting the processing gas into plasma in the plasma generation region to perform plasma processing on a film formed on the substrate. The flow rate of the processing gas supplied to the region where the processing amount of the plasma processing is to be increased is determined based on the step of acquiring the in-plane processing amount distribution by the plasma processing of the formed film and the acquired in-plane processing amount distribution. The process of adjusting the flow rate of the processing gas so that the flow rate of the processing gas supplied to the region where the processing amount of the plasma processing is desired to be relatively high or reduced is relatively low, and the processing in which the flow rate is adjusted Supplying a gas into a predetermined plasma processing region and subjecting the film formed on the substrate to plasma processing. [Selection] Figure 8 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11131023-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180053242-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7131916-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018174300-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017135313-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230117699-A |
| priorityDate |
2014-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |