http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017053792-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45519
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b8788505097437deb10dd8dfdc8458f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0627951b24f1c34ee9f71702c198b98a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc0202b17ba2746f1d27ced58e172d38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_621b2912540f8fca3cc01777dcbefbac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e50e6603b5f536e2a0fe152ed02cefb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac403b38b142e2ce65d41a9ae257430b
publicationDate 2017-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017053792-A1
titleOfInvention High Temperature Thermal ALD Silicon Nitride Films
abstract Methods for the deposition of SiN films comprising sequential exposure of a substrate surface to a silicon halide precursor at a temperature greater than or equal to about 600° C. and a nitrogen-containing reactant.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10787739-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I795697-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11587783-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022112602-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11220747-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11469147-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020092046-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020092047-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021262428-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11479855-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11056337-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111900075-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11664217-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10770287-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11784043-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I715918-B
priorityDate 2015-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579030
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415877653
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID807
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559527
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83497
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83498
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530954
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520479
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82247
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559516
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559213
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419554831
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID213013
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9321
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24816
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6547
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556587
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414859283
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID260
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24408
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419550829
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527031
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415777190

Total number of triples: 73.