http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201315838-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2012-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_619d813e3f91433ef8149be1f910ade1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c0b57b00bb95b9d1720de39bce6c5bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33d2d8c32fdb09647f213731119047f5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acfcad461ae1ae048d355f8a49043370 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_939f156a389c960f575391b4a99bd414 |
| publicationDate | 2013-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201315838-A |
| titleOfInvention | Self-limiting reaction deposition device and self-limiting reaction deposition method |
| abstract | A self-limiting reaction deposition apparatus includes a first guide roller, a second guide roller, and at least one first head. The first guiding roller changes a conveying direction of one of the base materials from a first direction to a non-parallel to the first direction while supporting a first surface of one of the base materials conveyed by a roll-to-roll process The second direction. The second guiding roller changes the conveying direction of the base material from the second direction to a third direction that is not parallel to the second direction while supporting the first surface of the base material. The at least one first head is disposed between the first guide roller and the second guide roller, faces a second surface opposite the first surface of the base material, and is discharged toward the second surface for Self-limiting reaction deposits one of the raw material gases. |
| priorityDate | 2011-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.