| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45555
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2017533995-A |
| titleOfInvention |
High speed deposition of mixed oxide barrier films. |
| abstract |
The present disclosure relates to a metal oxide barrier film, and more particularly to a high-speed method of depositing such a barrier film. Disclosed is a method capable of forming a barrier film with a water vapor transmission rate (WVTR) of less than 0.1 g / (m 2 ยท day). Disclosed is a method for continuously transporting a substrate in an atomic layer deposition (ALD) reactor and performing a limited number of ALD cycles to achieve a desired WVTR. [Selection] Figure 5 |
| priorityDate |
2014-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |