| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5df5525854dee227f901af488c86abe8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-549 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-10 |
| filingDate |
2014-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53a62def4e6139f07e4991aecfaa0b1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bc1cbe60330bbffa94319dc49b27ac6 |
| publicationDate |
2015-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015148557-A1 |
| titleOfInvention |
Molecular layer deposition using reduction process |
| abstract |
A material is deposited onto a substrate by exposing the substrate to a metal-containing precursor to adsorb metal atoms of the metal-containing precursor to the substrate. The substrate injected with the metal-containing precursor is exposed to an organic precursor to deposit a layer of material by a reaction of the organic precursor with the metal atoms adsorbed to the substrate. The substrate is exposed to radicals of a reducing agent to increase reactivity of the material deposited on the substrate. The radicals of the reducing agent are produced by applying a voltage differential with electrodes to a gas such as hydrogen. The substrate may be exposed to radicals before and/or after exposing the substrate to the organic precursor. The substrate may be sequentially exposed to two or more different organic precursors. The material deposited on the substrate may be a metalcone such as Alucone, Zincone, Zircone, Titanicone, or Nickelcone. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015267959-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021096786-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10985360-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11139460-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014037846-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11339472-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11588142-B2 |
| priorityDate |
2013-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |