http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201024454-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45551 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2009-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74269cefd1302c083f912f9be1e99325 |
| publicationDate | 2010-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201024454-A |
| titleOfInvention | Film deposition apparatus, substrate process apparatus, film deposition method, and computer readable storage medium |
| abstract | A film Deposition apparatus is configured to Deposit a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to stack multiple layers of a reaction product in a vacuum chamber so that a thin film is formed. The film Deposition apparatus includes a rotation table, a substrate providing area, a first reaction gas supplying part, a second reaction gas supplying part, a separation area, a enter part area, an evacuation opening, and a substrate cooling part. |
| priorityDate | 2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.