| abstract |
Disclosed is a radiation-sensitive resin composition which is highly transparent to radiation while being excellent in basic physical properties of a resist such as sensitivity, resolution and pattern shape. This radiation-sensitive resin composition is particularly high in resolution, large in DOF and excellent in LER. Also disclosed are a polymer applicable to such a composition, and a novel compound used for synthesizing such a polymer. This novel compound is represented by the following formula (2). (2) In the formula (2), R4 represents a methyl group, a trifluoromethyl group or a hydrogen atom; at least one of Rf's represents a fluorine atom, or a straight chain or branched perfluoroalkyl group having 1-10 carbon atoms; A represents a divalent organic group or a single bond; G represents a divalent organic group containing a fluorine atom or a single bond; Mm+ represents a metal ion or an onium cation; m represents a natural number of 1-3; and p represents a natural number of 1-8. |