| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e548f9ea5a33ea341372a264b2b3713
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_015b6bf758999a4b37ca481543d6ef56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2af35ea2547cca82d909be6ec2b9c3c1 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2012-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a526ea627f56d44e1dce6d325c5a7d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14a2f9af9e578e396537c5a1f6be7455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_840db78129da2cdcd3779c49205f1bfe |
| publicationDate |
2014-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8815491-B2 |
| titleOfInvention |
Chemically amplified negative resist composition and patterning process |
| abstract |
A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms a negative resist pattern of a profile with minimized LER and undercut. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9904172-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017210836-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9969829-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9645493-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016161850-A1 |
| priorityDate |
2011-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |