Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d960737960f62404581c24a56336c65a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a446df894b80a96c6219f317b560828f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_46a72a171074a9ff29d1dd66ecee31f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_afd92fd42903f4a5db6134090b0b8958 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1b2fd628784d8ea95b60a6af94a31be9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf7b5b18ebf598a60bb4ad68d2a80485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_068bd02968f0df46131a331ddcf56db3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_333b005b54e4722004c98339927fa867 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2103-74 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C303-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D493-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C303-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-06 |
filingDate |
2008-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2015-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0663cd85c495692297f57e93d203a8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b4f1dc9c58cacf78b1347920cb9f22e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2fe006361bef9351a6c4e03bddcc4c5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11f701fee475ab77f8f23f4b85e55682 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b9a610043105f817fd11d7db017d1a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61c49d755e8b9fc8253490c7959f081d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1619ac90fb7353ae9fcd57abbfe4aed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ffc1c6563eea4a7dd5e59a5a97b25086 |
publicationDate |
2015-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9034556-B2 |
titleOfInvention |
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
abstract |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: n nwherein R X represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q 2 and Q 3 independently represents a single bond or a divalent linkage group; Y 1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z + represents an organic cation exclusive of an ion represented by general formula (w-1). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016347709-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10221131-B2 |
priorityDate |
2007-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |