patent/WO-2008099869-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008099869-A1

Outgoing Links

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filingDate	2008-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0196436dfc817d4af1c8d57f9a0ed219 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73a3b6a7e9bc737855d46800e14661d8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaf7942244801df09ce737ed9d3f82fa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_323f5298efe3a0bcb8daf9d820a81379
publicationDate	2008-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	WO-2008099869-A1
titleOfInvention	Compound for photoacid generator, resist composition using the same, and pattern-forming method
abstract	An onium sulfonate salt represented by the formula (1) below can be used as an excellent radiation-sensitive acid generator for resist compositions. A good pattern can be formed by using a resist composition containing the onium sulfonate salt. [chemical formula 64] In the formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or an iodonium cation.
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priorityDate	2007-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 107.