| abstract |
A resin having high sensitivity to ArF excimer laser light and the like, having no problem in human body accumulation, sufficiently high acidity of the generated acid (photogenerated acid), and high solubility in a resist solvent and a resin. The present invention provides a photoacid generator having excellent compatibility with respect to and a resist material containing such a photoacid generator. The above problem is solved by using a photoacid generator characterized by generating a sulfonic acid represented by the following general formula (2). Embedded image (In the formula, n represents an integer of 1 to 10. R represents a substituted or unsubstituted linear, branched or cyclic alkyl group, alkenyl group, substituted or unsubstituted carbon number of 1 to 20 carbon atoms. An aryl group having 15 to 15 carbon atoms or a heteroaryl group having 4 to 15 carbon atoms). A resist pattern formed using such a photoacid generator exhibits excellent performance in terms of substrate adhesion and etching resistance. [Selection figure] None |