Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): n nin the formulae, each of Y 1 and Y 2 represents a monovalent organic group; each of M 1 + and M 2 + represents an organic onium ion; each of X 1 and X 2 represents a group that is represented by —S—, —NH—, or —NR 1 —; R 1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R 1 and Y 1 or Y 2 may bond with each other to form a ring.