| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3b2a39b03704a1a91d8c6f36bd6f2ad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_052701b6b017cc29faa0fcda1a32632a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3625fa7db1eb35e7aa8e07de7dbceb84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_474f38ab219552d2ed9d4893b38c3199 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2325-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 |
| filingDate |
2013-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3811d8f112c15f6f2ca0822a29dbd5a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf2237819eb8afef28e71a4d605ed725
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a839ea6752facf7138b8d765bb71be77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65a44f5559915139da5d0b9685715bf3 |
| publicationDate |
2014-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014030640-A1 |
| titleOfInvention |
Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| abstract |
A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10649339-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9904167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016116840-A1 |
| priorityDate |
2011-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |