| abstract |
(57) [Problem] To provide a novel diazomethane compound which, when used as an acid generator of a chemically amplified resist, provides a chemically amplified resist which has excellent resolution and provides a resist pattern having a good cross-sectional shape. provide. SOLUTION: The general formula R 1 -SO 2 -C (N 2 ) -SO 2- [Z-SO 2 -C (N 2 ) -SO 2 ] n -R 2 (wherein R 1 and R 2 are the same or different cyclic hydrocarbon groups having 6 to 15 carbon atoms, Z is a divalent hydrocarbon group, n is an integer of 1 to 5). |