| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72ad459cfacb1b12892184f81257195
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d873527bf36cd394eb69b96669096e4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba36c822181bace55d6cd8b84b9da78d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_313e76dcc4e63861598413110cbd7cdd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f3f40fb4bf40f48e0725ca420a0b6106 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F226-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-06 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F226-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F224-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F228-06 |
| filingDate |
2012-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a01363c2758b42bad6831e99e8931b8a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc5762b5aaf5efc3fd2a102127268e45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df57c2fd913b0d7cd3cdeb00beb83538
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0504ba3cda97273267425bc5d985f36d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa09cd52e5c0e042671d328695c67428 |
| publicationDate |
2016-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9250531-B2 |
| titleOfInvention |
Method of forming resist pattern and negative tone-development resist composition |
| abstract |
A method of forming a resist pattern including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent by action of an acid; exposing the resist film; and patterning by a negative-tone development using a developing solution containing the organic solvent, wherein the base component (A) contains a resin component (A1) having a structural unit (a0) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid, and the developing solution contains a nitrile solvent. |
| priorityDate |
2011-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |