| abstract |
(57) [Problem] To provide an excellent positive photoresist composition which is excellent in resolution and developability, and in particular, in which isolated pattern skipping is suppressed. SOLUTION: This positive resist composition contains an alkali-soluble resin, a 1,2-quinonediazide compound, and a polymer compound having a fluoroaliphatic group derived from a specific fluoroaliphatic compound in a side chain. object. |