| abstract |
A resist composition comprising (A) an acid generator represented by formula (1):n nwherein S 1 to S 8 each independently represents a substituent; a, n, m, l, k, o, p, q and r each independently represents an integer of 0 to 2; X represents a single bond or a divalent linking group; R 1 and R 2 each independently represents a hydrogen atom or a substituent, and R 1 and R 2 may combine with each other to represent a single bond or a divalent linking group; and Y - and Z - each independently represents an organic sulfonate anion. |