| abstract |
(57) [Summary] [Structure] (a) Containing a triazine compound having at least two crosslinkable functional groups, (b) a highly light-absorbing substance, and optionally (c) an alkali-insoluble acrylic resin It is a multi-layer resist material in which a base material for lithography and a layer of the base material and a resist layer are sequentially provided on a substrate. Preferably, the component (a) is a triazine compound having a hydroxyl group and / or an alkoxyl group, In particular, melamine or guanamine substituted with a methylol group and / or an alkoxymethyl group, the component (b) is a benzophenone-based, diphenylsulfone-based or diphenylsulfoxide-based resin, and the component (c) is an acrylic resin having a glycidyl group. [Effects] Reflected light from the substrate can be sufficiently suppressed, no intermixing layer is generated, notching does not occur, dimensional accuracy with respect to the mask pattern is excellent, and a rectangular cross section has a high resolution and a high aspect ratio resist pattern. give. |