| abstract |
(57) [Summary] (Modified) [Constitution] Alkali-soluble resin, quinonediazide group-containing compound, and general formula (1) [R f is a C 6-10 fluorinated alkyl group, R 1 is H or a C 1-5 alkyl group, R 2 is a C 2-5 alkyl group having two or more hydroxyl groups, etc.] , general formula (2) R g - (CH 2) m -OCH 2 CH (OH) -CH 2 OH ... (2) (R g is a perfluoroalkyl group having 4 to 20 carbon atoms, m Is an integer of 1 or 2) or a nonionic fluorine-containing organosiloxane compound having only a perfluoroalkyl group-containing siloxane bond and a polyoxyethylene type polyether bond is used as the alkyl 2-oxypropionate- A positive photoresist composition prepared by dissolving in alkyl acetate, alkyl 2-oxypropionate-propylene glycol monoalkyl ether acetate and the like. [Effect] To provide a positive photoresist composition that does not cause striation and is excellent in defoaming property and wetting property and thus does not cause defective coating film or defective development. |