| abstract |
The invention relates to a lithography composition which comprises a compound represented by formula (1). [LxTe (OR1) y] (1) [in the formula: L represents a ligand other than OR1; R 1 represents a hydrogen atom, an optionally substituted linear alkyl group having 1 to 20 carbon atoms, an optionally substituted branched or cyclic alkyl group having 3 to 20 carbon atoms, an optionally substituted aryl group having from 6 to 20 carbon atoms, or an optionally substituted alkenyl group having 2 to 20 carbon atoms; x is an integer from 0 to 6; and y is an integer from 0 to 6, provided that x + y is from 1 to 6, and that when x is greater than or equal to 2, L may be the same or different, and that when y is greater than or equal to 2, equal to 2, R1 may be the same or different]. |