| abstract |
PROBLEM TO BE SOLVED: To provide a cyclic compound having a high sensitivity, a high resolution, a high etching resistance, a low outgas amount and a good resist pattern shape, a radiation sensitive composition containing the compound, and a resist pattern forming method using the radiation sensitive composition I will provide a. SOLUTION: A cyclic compound represented by the following formula (1) that satisfies a specific condition, a radiation-sensitive composition containing the compound, and a resist pattern forming method using the radiation-sensitive composition. [Chemical 1] (1) [Selection figure] None |