http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012226297-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2011-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f2053be723a5329e3d7a9c3d3aa07f4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f1bc73deb335da3a254262ee1090eb5 |
publicationDate | 2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2012226297-A |
titleOfInvention | Resist antistatic film laminate, relief pattern manufacturing method, and electronic component |
abstract | An object of the present invention is to avoid charge-up phenomenon, suppress sensitivity change after electron beam drawing, enable pattern formation with dimensions as designed, and have alkali developability, high sensitivity, high resolution, low Providing a resist antistatic film laminate that provides a fine relief pattern with line edge roughness. [MEANS FOR SOLVING PROBLEMS] (I) One kind selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group at the ortho position of a phenolic hydroxyl group, having two or more phenolic hydroxyl groups in one molecule. A negative containing the phenolic compound (A) having a molecular weight of 400 to 2500 having the above substituent and an acid generator (B) that generates a sulfonic acid to which fluorine atoms are not bonded by irradiation with an electron beam. A resist film comprising at least a negative resist composition in which the content of the phenolic compound (A) in the total solid content of the type resist composition is 70% by weight or more, and (II) an antistatic film Antistatic film laminate. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160047525-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013107841-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016280621-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10526266-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102239728-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105849638-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9541827-B2 |
priorityDate | 2011-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 331.