http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013107841-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17 |
filingDate | 2011-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56b84aecf81542cd7add5e102bf77ccc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38cda665ecfe4d76feced71d76a01cd0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f5b5b33259f1c7cdc81d64b3e5956f0 |
publicationDate | 2013-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013107841-A |
titleOfInvention | CYCLIC COMPOUND, PROCESS FOR PRODUCING THE SAME, RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
abstract | Kind Code: A1 Provided are a cyclic compound represented by a specific chemical structural formula, useful as an acid amplification type non-polymer resist material, a radiation sensitive composition containing the same, and a resist pattern forming method using the radiation sensitive composition To do. The compound represented by the formula (1) has a molecular weight of 500 to 5,000. (In the formula, each R 0 independently represents a hydrogen atom, a hydroxyl group, an alkyl group, a hydroxyalkyl group, a cyclohexylphenyl group, an alkylphenyl group or the like.) [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110183297-A |
priorityDate | 2011-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 794.