| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-1785 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56b84aecf81542cd7add5e102bf77ccc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8 |
| publicationDate |
2017-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I607990-B |
| titleOfInvention |
Low-molecular compound, sensitive radiation linear composition, and photoresist pattern formation method |
| priorityDate |
2011-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |