| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-92 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C41-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C37-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2010-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56b84aecf81542cd7add5e102bf77ccc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8 |
| publicationDate |
2012-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120047272-A |
| titleOfInvention |
Cyclic compound, the manufacturing method, the radiation sensitive composition, and the resist pattern formation method |
| abstract |
The cyclic compound represented by following formula (1). (Wherein L, R 1 , R 'and m are as defined in the specification) The cyclic compound represented by Formula (1) is useful as a component of a radiation sensitive composition because it has high solubility in a safe solvent, high sensitivity, and gives a good resist pattern shape. |
| priorityDate |
2009-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |