| abstract |
【Task】 A radiation-sensitive resist composition that is sensitive not only to ultraviolet rays such as i rays and g rays, but also to excimer laser rays such as visible rays and KrF, electron rays, extreme ultraviolet rays (EUV), X rays and ion beams. provide. Provided is a non-polymeric radiation-sensitive resist composition having high sensitivity, high resolution, high heat resistance, and solvent solubility by a simple production process. [Solution] A radiation-sensitive resist composition comprising a resist compound (A), an acid generator (B), and an acid crosslinking agent (C). The resist compound (A) is produced by a condensation reaction with (a) an aromatic ketone or aromatic aldehyde having 5 to 45 carbon atoms and a compound having 6 to 15 carbon atoms and having 1 to 3 phenolic hydroxyl groups. And (b) its molecular weight is 300-5000. [Selection] Nothing |