| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22f46e1eaf80558943bb3168348a2995
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8256a2a4d2654652c699082ef46a53b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27c0e625ff28044476cb42c38e21741a |
| publicationDate |
2003-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003207893-A |
| titleOfInvention |
Photosensitive resin composition and pattern forming method using the same |
| abstract |
(57) [Summary] [Problem] To form a fine pattern in a unit of μm, to have excellent perpendicularity on the side surface of the pattern shape, and to have a suitable thermal fluidity capable of making a flat surface at the top of the pattern curved. The photosensitive resin composition has a pattern shape that provides good reflection characteristics over a wide viewing angle. In a photosensitive resin composition containing an alkali-soluble resin, a photosensitive acid generator and a crosslinking agent, a softening temperature is 134 ° C. or more as an alkali-soluble resin component. It is characterized by containing a low molecular weight phenol resin having a temperature of 230 ° C. or lower. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005326838-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4569119-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4687095-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4687094-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006169136-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006169137-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005221947-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4609649-B2 |
| priorityDate |
2002-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |