| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-92 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C47-546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C47-546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-12 |
| filingDate |
2010-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5786713-B2 |
| titleOfInvention |
CYCLIC COMPOUND, PROCESS FOR PRODUCING THE SAME, RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
| priorityDate |
2009-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |