http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5109338-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5109338-B2 |
| titleOfInvention | Resist underlayer film forming material and multilayer resist pattern forming method |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009173623-A |
| priorityDate | 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 605.